Substrate transfer system and substrate processing system

ABSTRACT

A substrate transfer system includes a substrate transfer robot. The substrate transfer robot is provided between a first apparatus and a second apparatus which has a wall provided opposite to the substrate transfer robot and having an opening on the wall. The substrate transfer robot is configured to transfer a substrate from the first apparatus to the second apparatus via the opening and includes a base having a first axis, an arm body, and a hand. The arm body has a proximal end and a distal end and is connected to the base at the proximal end to rotate around the first axis. The substrate transfer robot includes a minimum distance from the first axis to an outermost portion of the arm body and the hand in a radius direction from the first axis being larger than a distance between the first axis and the opening on the wall.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation application of the U.S. patentapplication Ser. No. 14/073,871 filed Nov. 7, 2013, which claimspriority under 35 U.S.C. §119 to the U.S. Provisional Application No.61/724,435, filed Nov. 9, 2012. The contents of these applications areincorporated herein by reference in their entirety.

BACKGROUND

Field of the Invention

The present invention relates to a substrate transfer system and asubstrate processing system.

Discussion of the Background

Japanese Unexamined Patent Application Publication No. 2009-136981discloses a substrate transfer system including a substrate transferrobot that transfers a substrate to a different position.

The substrate transfer system disclosed in Japanese Unexamined PatentApplication Publication No. 2009-136981 includes a robot (substratetransfer robot) that includes a lower arm, an upper arm, and a hand. Thelower arm is rotatable on a horizontal surface relative to a base. Theupper arm is rotatable on the horizontal surface relative to the lowerarm. The hand is rotatable on the horizontal surface relative to theupper arm. The robot of the substrate transfer system is disposed in arobot installment area defined between a cassette apparatus (firstapparatus) and a processing apparatus (second apparatus). The cassetteapparatus accommodates substrates, and the processing apparatusprocesses a substrate.

SUMMARY

According to one aspect of the present invention, a substrate transfersystem includes a substrate transfer robot. The substrate transfer robotis provided between a first apparatus and a second apparatus which has awall provided opposite to the substrate transfer robot and having anopening on the wall. The substrate transfer robot is configured totransfer a substrate from the first apparatus to the second apparatusvia the opening and includes a base having a first axis, an arm body,and a hand. The arm body has a proximal end and a distal end and isconnected to the base at the proximal end to rotate around the firstaxis. The hand is connected to the distal end of the arm body andconfigured to hold the substrate so as to carry the substrate from thefirst apparatus to the second apparatus. The substrate transfer robotincludes a minimum distance from the first axis to an outermost portionof the arm body and the hand in a radius direction from the first axisbeing larger than a distance between the first axis and the opening onthe wall.

According to another aspect of the present invention, a substratetransfer system includes a first apparatus, a second apparatus which hasa wall having an opening on the wall, and a substrate transfer robot.The substrate transfer robot is provided between the first apparatus andthe second apparatus and opposite to the opening. The substrate transferrobot is configured to transfer a substrate from the first apparatus tothe second apparatus via the opening and includes a base having a firstaxis, an arm body, and a hand. The arm body has a proximal end and adistal end and is connected to the base at the proximal end to rotatearound the first axis. The hand is connected to the distal end of thearm body and configured to hold the substrate so as to carry thesubstrate from the first apparatus to the second apparatus. Thesubstrate transfer robot includes a minimum distance from the first axisto an outermost portion of the arm body and the hand in a radiusdirection from the first axis being larger than a distance between thefirst axis and the opening on the wall.

BRIEF DESCRIPTION OF THE DRAWINGS

A more complete appreciation of the present disclosure and many of theattendant advantages thereof will be readily obtained as the samebecomes better understood by reference to the following detaileddescription when considered in connection with the accompanyingdrawings, wherein:

FIG. 1 is a plan view of a substrate processing system according to afirst embodiment, illustrating a general arrangement of the substrateprocessing system;

FIG. 2 is a schematic side view of the substrate processing systemaccording to the first embodiment, illustrating a general arrangement ofthe substrate processing system;

FIG. 3 is a perspective view of a substrate transfer robot of thesubstrate processing system according to the first embodiment;

FIG. 4 is a plan view of the substrate processing system according tothe first embodiment, illustrating a minimal rotation area of thesubstrate transfer robot;

FIG. 5 illustrates a procedure of an operation by the substrateprocessing system according to the first embodiment in transferring asubstrate placed at a position far from the substrate transfer robot;

FIG. 6 illustrates a procedure of an operation by the substrateprocessing system according to the first embodiment in transferring asubstrate placed at a position close to the substrate transfer robot;

FIG. 7 is a schematic side view of a substrate processing systemaccording to a second embodiment, illustrating a general arrangement ofthe substrate processing system;

FIG. 8 is a schematic side view of a substrate processing systemaccording to a third embodiment, illustrating a general arrangement ofthe substrate processing system;

FIG. 9 is a schematic side view of a substrate processing systemaccording to a fourth embodiment, illustrating a general arrangement ofthe substrate processing system; and

FIG. 10 is a perspective view of a modification of the substratetransfer robot of the substrate processing system according to any ofthe first to fourth embodiments.

DESCRIPTION OF THE EMBODIMENTS

The embodiments will now be described with reference to the accompanyingdrawings, wherein like reference numerals designate corresponding oridentical elements throughout the various drawings.

First Embodiment

First, by referring to FIGS. 1 to 6, a configuration of a substrateprocessing system 100 according to the first embodiment will bedescribed.

As shown in FIGS. 1 and 2, the substrate processing system 100 includesa substrate transfer system 10 and a processing apparatus 20. Thesubstrate transfer system 10 transfers a substrate 110. In the substrateprocessing system 100, the substrate transfer system 10 transfers thesubstrate 110 to the processing apparatus 20. The processing apparatus20 processes the transferred substrate 110 in a manufacturing process ofa semiconductor device.

The substrate transfer system 10 includes a substrate storage apparatus11 and a substrate transfer robot 12. The substrate storage apparatus 11accommodates substrates 110, and the substrate transfer robot 12transfers the substrate 110 between the substrate storage apparatus 11and the processing apparatus 20. In plan view (when viewed from above),the outer shape of the substrate transfer system 10 is a combination(indicated by the broken line in FIG. 1) of an installment area of thesubstrate storage apparatus 11 and a robot installment area 13, which iswhere the substrate transfer robot 12 is disposed, as described later.The robot installment area 13 is defined between a front wall 111,described later, of the substrate storage apparatus 11 and a rear wall201 of the processing apparatus 20. The substrate transfer system 10also includes an FFU (Fan Filter Unit), not shown, to keep the airinside the robot installment area 13 clean. The substrate storageapparatus 11 is an example of the “first apparatus”, and the processingapparatus 20 is an example of the “second apparatus”.

The substrate storage apparatus 11 corresponds to the FOUP (Front OpenUnified Pod) of the SEMI (Semiconductor Equipment and MaterialsInternational) standard. As shown in FIGS. 1 and 2, the front wall 111of the substrate storage apparatus 11 is disposed at the side (the X1direction side) of the substrate transfer robot 12 and the processingapparatus 20. The front wall 111 has a perpendicular surface. Thesubstrate storage apparatus 11 includes four cassettes 11 a to 11 ddisposed at different positions in plan view. The four cassettes 11 a to11 d are aligned next to each other in the Y direction. As shown in FIG.2, the four cassettes 11 a to 11 d are disposed on a cassette support112. Also the four cassettes 11 a to 11 d are each capable ofaccommodating a plurality of substrates 110 at different heightpositions. Specifically, each of the four cassettes 11 a to 11 d has 25levels of positions in the vertical direction, accommodating a stack ofup to 25 substrates 110. The front wall 111 is an example of the “firstwall”, and each of the positions in the four cassettes 11 a to 11 d isan example of the “first position”.

As shown in FIGS. 1 to 3, the substrate transfer robot 12 is amulti-articular robot. Specifically, the substrate transfer robot 12includes a base 121, a support shaft 122, a first arm 123, a second arm124, a hand 125, and a controller 126. The controller 126 controls theseelements of the substrate transfer robot 12. The first arm 123 and thesecond arm 124 are examples of the “arm”.

The support shaft 122 is supported by the base 121 and is elongate inthe direction perpendicular to the upper surface of the base 121. At anupper end, the support shaft 122 is coupled to one end of the first arm123. The first arm 123 is rotatable on a horizontal surface about thesupport shaft 122 as the center of rotation. At another end, the firstarm 123 is coupled to one end of the second arm 124. The second arm 124is rotatable on the horizontal surface about, as the center of rotation,the one end of the second arm 124 coupled to the first arm 123. Atanother end, the second arm 124 is coupled to the hand 125. The hand 125is rotatable on the horizontal surface about, as the center of rotation,the portion of the hand 125 coupled to the second arm 124. Also the hand125 is capable of supporting the substrate 110 from below the substrate110. The first arm 123 and the second arm 124 have link lengthsapproximately equal to one another. Specifically, as shown in FIG. 1,the first arm 123 has a link length R1 from a center C1 of rotation ofthe first arm 123 to a center C2 of rotation of the second arm 124,while the second arm 124 has a link length R2 from the center C2 ofrotation of the second arm 124 to a center C3 of rotation of the hand125. The link length R1 and the link length R2 are approximately equalto one another. This eliminates or minimizes complexity of the operationcontrol of the elements involved in transfer of the substrate 110, ascompared with the case where the link lengths of the first arm 123 andthe second arm 124 are different from one another.

The substrate transfer robot 12 moves the support shaft 122 up and downto integrally move the first arm 123, the second arm 124, and the hand125 up and down. This enables the substrate transfer robot 12 to feedand take the substrate 110 to and from all the different heightpositions in the cassettes 11 a to 11 d.

The controller 126 is taught in advance operations of the elements fortransfer of the substrate 110 on the hand 125. Specifically, thecontroller 126 is taught in advance operations of the elementsassociated with the feeding and taking operations of the substrate 110to and from the four cassettes 11 a to 11 d. This ensures that thesubstrate transfer robot 12 performs a transfer operation with respectto the substrate 110 according to an operation procedure, describedlater.

As shown in FIGS. 1 and 2, the rear wall 201 of the processing apparatus20 is disposed at the side (the X2 direction side) of the substratetransfer robot 12 and the substrate storage apparatus 11. The rear wall201 has a perpendicular surface, and is approximately parallel to andopposed to the front wall 111. On the rear wall 201, an approximatelyrectangular opening 202 is disposed. As shown in FIG. 1, the opening 202has an opening width B in the horizontal direction (Y direction). Theopening width B is large enough to allow the substrate 110 to beinserted through the opening 202. As shown in FIG. 2, the opening 202has an opening length H1. The opening length H1 is larger in the heightdirection (Z direction) than the movable range in the height directionof the first arm 123, the second arm 124, and the hand 125 of thesubstrate transfer robot 12. Specifically, the opening 202 is open froma first height position through to a second height position. The firstheight position corresponds to a position at which the substratetransfer robot 12 has access to a lowest position among the 25 levels ofpositions in the cassettes 11 a to 11 d. The second height positioncorresponds to another position at which the substrate transfer robot 12has access to a highest position among the 25 levels of positions in thecassettes 11 a to 11 d. The rear wall 201 is an example of the “secondwall”.

Here, in the first embodiment, the substrate transfer robot 12 iscapable of transferring a substrate 110 in the substrate storageapparatus 11 to the placement position in the processing apparatus 20through the opening 202, while at the same time being capable oftransferring a substrate 110 in the processing apparatus 20 to apredetermined position in the substrate storage apparatus 11. Thesubstrate transfer robot 12 has a minimal rotation area having an outerperiphery that overlaps the inside of the processing apparatus 20through the opening 202. Specifically, the substrate transfer robot 12has a minimal rotation radius R, and the minimal rotation radius R islarger than the distance between the center C1 of rotation of the firstarm 123 and the rear wall 201 of the processing apparatus 20. As shownin FIG. 4, the minimal rotation area of the substrate transfer robot 12is an area necessary when the substrate transfer robot 12 takes a normalposture in which the first arm 123, the second arm 124, and the hand 125supporting the substrate 110 are superimposed over each other and whenthe substrate transfer robot 12 in the normal posture rotates the firstarm 123 on the horizontal surface. The placement position in theprocessing apparatus 20 is an example of the “second position”.

When the substrate transfer robot 12 is in the normal posture, a firstdistance between the center C1 of rotation of the first arm 123 and thedistal end of the first arm 123, a second distance between the center C1of rotation of the first arm 123 and the distal end of the second arm124, and a third distance between the center C1 of rotation of the firstarm 123 and the distal end of the substrate 110 supported by the hand125 are approximately equal to each other. Each of the first to thirddistances is equal to the minimal rotation radius R of the substratetransfer robot 12 and larger than the distance between the center C1 ofrotation of the first arm 123 and the rear wall 201.

As shown in FIG. 4, in the substrate transfer robot 12, the center C1 ofrotation of the first arm 123 is disposed at a position that faces theopening 202. Specifically, in plan view, the center C1 of rotation ofthe first arm 123 is disposed on a line L1 extending from the center ofthe substrate 110 placed at the placement position in the processingapparatus 20 to an approximate center of the opening 202. Also thecenter C1 of rotation of the first arm 123 is disposed at a positionthat faces the front wall 111 of the substrate storage apparatus 11.Specifically, in plan view, the center C1 of rotation of the first arm123 is disposed at a position that faces an approximate center in the Ydirection of the four cassettes 11 a to 11 d of the substrate storageapparatus 11. Also the center C1 of rotation of the first arm 123 iscloser to the front wall 111 of the substrate storage apparatus 11 thanto the rear wall 201 of the processing apparatus 20. Between thesubstrate transfer robot 12 and the substrate storage apparatus 11, apredetermined regulation width is included. The predetermined regulationwidth is determined depending on an opener (opening and closingmechanism), not shown, that opens and closes the doors of the cassettes11 a to 11 d. A distance D (see FIG. 1) between the substrate storageapparatus 11 and the processing apparatus 20 is larger than acombination of the regulation width of the opener and the distancebetween the base end of the hand 125 and the distal end of the substrate110 supported by the hand 125.

Next, an operation procedure of substrate transfer by the substratetransfer system 10 according to the first embodiment will be described.

First, by referring to FIG. 5, description will be made with regard toan operation of transferring a substrate 110 in the cassette 11 a, whichis farther from the substrate transfer robot 12, to the placementposition in the processing apparatus 20. As shown in the lowerright-hand corner of FIG. 5, the substrate transfer robot 12 moves thehand 125 to a position under a substrate 110 in the cassette 11 a so asto support the substrate 110. Then, the substrate transfer robot 12linearly moves the hand 125 toward the processing apparatus 20 (in theX1 direction), thereby pulling the substrate 110 out of the cassette 11a, and takes a stand-by posture. Then, the substrate transfer robot 12rotates the hand 125 alone to put a center 110 a of the substrate 110onto an imaginary line L2, thus taking a first intermediate posture. Theimaginary line L2 extends in a direction (Y direction) approximatelyparallel to the rear wall 201 of the processing apparatus 20 in planview, and is at an approximately equal distance from the front wall 111and the rear wall 201. In the first intermediate posture, the substratetransfer robot 12 does not protrude into the processing apparatus 20.

The substrate transfer robot 12 changes from the first intermediateposture into a second intermediate posture. Specifically, the substratetransfer robot 12 transfers the substrate 110 with the center 110 a ofthe substrate 110 moving along the imaginary line L2, thereby foldingthe first arm 123 and the second arm 124 together and changing into thesecond intermediate posture. Here, by folding the first arm 123 and thesecond arm 124 together, the substrate transfer robot 12 makes the endsof the first arm 123 and the second arm 124 protrude into the processingapparatus 20 through the opening 202.

Then, the substrate transfer robot 12 rotates the hand 125 so as to foldthe first arm 123, the second arm 124, and the hand 125 together,thereby changing from the second intermediate posture into the normalposture. Here, the first arm 123, the second arm 124, and the hand 125are disposed with their lengths oriented in a direction (X direction)orthogonal to the rear wall 201. Also the ends of the first arm 123 andthe second arm 124 and a part of the substrate 110 supported by the hand125 protrude into the processing apparatus 20 through the opening 202.

Then, the substrate transfer robot 12 changes from the normal postureinto a third intermediate posture. Specifically, the substrate transferrobot 12 rotates the first arm 123 and the second arm 124 with the firstarm 123 and the second arm 124 folded together, thereby making the firstarm 123 and the second arm 124 extend in the Y1 direction from thecenter C1 of rotation of the first arm 123 side and changing into thethird intermediate posture. That is, the first atm 123 and the secondarm 124 are oriented in one direction (the Y1 direction) among thedirections (Y directions) that are orthogonal to the direction (Xdirection) that is from the center C1 of rotation of the first arm 123to the placement position in the processing apparatus 20. Also in thethird intermediate posture, the substrate 110 supported by the hand 125is partially beyond the opening 202. Then, the substrate transfer robot12 changes from the third intermediate posture by linearly moving thehand 125 in the direction (X1 direction) of the placement position inthe processing apparatus 20, thereby transferring the substrate 110 tothe placement position in the processing apparatus 20.

These movements ensure transfer of the substrate 110 from the cassette11 a to the placement position in the processing apparatus 20 withoutthe substrate transfer robot 12 contacting the substrate storageapparatus 11 and the processing apparatus 20. When transferring thesubstrate 110 from the placement position in the processing apparatus 20to the cassette 11 a, the substrate transfer robot 12 may follow theabove-described operation procedure in reverse order, so as to ensuretransfer without the substrate transfer robot 12 contacting thesubstrate storage apparatus 11 and the processing apparatus 20. Whentransferring to the placement position in the processing apparatus 20the substrate 110 in the cassette 11 d, which is at the opposite side ofthe cassette 11 a in the Y directions relative to the center thesubstrate storage apparatus 11, the substrate transfer robot 12 mayfollow the above-described operation procedure similarly to the cassette11 a, so as to ensure transfer. In the first embodiment, in the thirdintermediate posture of the substrate transfer robot 12, the first arm123 and the second arm 124 extend in the Y1 direction from the center C1of rotation of the first arm 123 in both cases of the cassettes 11 a and11 d.

Next, by referring to FIG. 6, description will be made with regard to anoperation of transferring a substrate 110 in the cassette 11 b, which iscloser to the substrate transfer robot 12, to the placement position inthe processing apparatus 20. As shown in the lower right-hand corner ofFIG. 6, the substrate transfer robot 12 moves the hand 125 to a positionunder a substrate 110 in the cassette 11 b so as to support thesubstrate 110. Then, the substrate transfer robot 12 linearly moves thehand 125 toward the processing apparatus 20 (in the X1 direction),thereby pulling the substrate 110 out of the cassette 11 b, and takesthe stand-by posture. In this state of the substrate transfer robot 12,the ends of the first arm 123 and the second arm 124 protrude into theprocessing apparatus 20 through the opening 202. Then, the substratetransfer robot 12 rotates the hand 125 alone to put the center 110 a ofthe substrate 110 onto the imaginary line L2, thus taking the firstintermediate posture.

The substrate transfer robot 12 changes from the first intermediateposture into the second intermediate posture. Specifically, thesubstrate transfer robot 12 transfers the substrate 110 with the center110 a of the substrate 110 moving along the imaginary line L2, therebyfolding the first arm 123 and the second arm 124 together and changinginto the second intermediate posture. Here, by folding the first arm 123and the second arm 124 together, the substrate transfer robot 12 makesthe ends of the first arm 123 and the second arm 124 protrude into theprocessing apparatus 20 through the opening 202. That is, throughout thestand-by posture, the first intermediate posture, and the secondintermediate posture of the substrate transfer robot 12, the ends of thefirst arm 123 and the second arm 124 protrude into the processingapparatus 20.

Then, the substrate transfer robot 12 rotates the hand 125 so as to foldthe first arm 123, the second arm 124, and the hand 125 together,thereby changing from the second intermediate posture into the normalposture. Here, the first arm 123, the second arm 124, and the hand 125are disposed with their lengths oriented in the direction (X direction)orthogonal to the rear wall 201. Also the ends of the first arm 123 andthe second arm 124 and a part of the substrate 110 supported by the hand125 protrude into the processing apparatus 20 through the opening 202.

Then, similarly to the case of the cassette 11 a, the substrate transferrobot 12 takes the third intermediate posture, in which the first arm123 and the second arm 124 extend in the Y1 direction from the center C1of rotation of the first arm 123. Then, the substrate transfer robot 12changes from the third intermediate posture by linearly moving the hand125 in the direction (X1 direction) of the placement position in theprocessing apparatus 20, thereby transferring the substrate 110 to theplacement position in the processing apparatus 20.

These movements ensure transfer of the substrate 110 from the cassette11 b to the placement position in the processing apparatus 20 withoutthe substrate transfer robot 12 contacting the substrate storageapparatus 11 and the processing apparatus 20. When transferring thesubstrate 110 from the placement position in the processing apparatus 20to the cassette 11 b, the substrate transfer robot 12 may follow theabove-described operation procedure in reverse order, so as to ensuretransfer without the substrate transfer robot 12 contacting thesubstrate storage apparatus 11 and the processing apparatus 20. Whentransferring to the placement position in the processing apparatus 20the substrate 110 in the cassette 11 c, which is at the opposite side ofthe cassette 11 b in the Y directions relative to the center thesubstrate storage apparatus 11, the substrate transfer robot 12 mayfollow the above-described operation procedure similarly to the cassette11 b, so as to ensure transfer. In the first embodiment, in the thirdintermediate posture of the substrate transfer robot 12, the first arm123 and the second arm 124 extend in the Y1 direction from the center C1of rotation of the first arm 123 in both cases of the cassettes 11 b and11 c. That is, in all of the cases of the cassettes 11 a to 11 d, in thethird intermediate posture of the substrate transfer robot 12, the firstarm 123 and the second arm 124 are oriented in the same direction (theY1 direction) as viewed from the center C1 of rotation of the first arm123.

In the first embodiment, the substrate transfer robot 12 transfers thesubstrate 110 from a position in the substrate storage apparatus 11 tothe placement position in the processing apparatus 20 through theopening 202, which is disposed on the processing apparatus 20. Here,with the hand 125 supporting the substrate 110, the outer periphery ofthe minimal rotation area of the substrate transfer robot 12 overlapsthe inside of the processing apparatus 20 through the opening 202. Thus,the opening 202, which is for transfer of the substrate 110 into theprocessing apparatus 20, is utilized in the rotation of the substratetransfer robot 12. This minimizes the distance between the substratetransfer robot 12 and the processing apparatus 20, as compared with theprocessing apparatus 20 being disposed to avoid overlapping with theminimal rotation area of the substrate transfer robot 12. This, as aresult, diminishes the robot installment area 13 and ensuresminiaturization. The diminished robot installment area 13 also ensures adiminished FFU (fan filter unit). This is particularly effective inapplications where the robot installment area 13 needs to be kept cleanby the FFU, as in the first embodiment. The miniaturization is effectivein applications where the substrate processing system 100 accommodates aplurality of apparatuses and is liable to increase in size, as in thefirst embodiment.

Also in the first embodiment, in the substrate transfer robot 12, thecenter C1 of rotation of the first arm 123 is at a position that facesthe opening 202 in plan view, and the minimal rotation radius R of thesubstrate transfer robot 12 is larger than the distance between thecenter C1 of rotation of the first arm 123 and the processing apparatus20. This configuration ensures that the outer periphery of the minimalrotation area of the substrate transfer robot 12 easily overlaps theinside of the processing apparatus 20 through the opening 202. This, inturn, easily diminishes the robot installment area 13 and ensuresminiaturization.

Also in the first embodiment, in the substrate transfer robot 12, thecenter C1 of rotation of the first arm 123 is closer to the front wall111 than to the rear wall 201 in plan view, and the minimal rotationradius R of the substrate transfer robot 12 is larger than the distancebetween the center C1 of rotation of the first arm 123 and the rear wall201. This configuration reduces the distance between the substratetransfer robot 12 and the front wall 111 as well as reducing thedistance between the substrate transfer robot 12 and the rear wall 201.This, in turn, further diminishes the robot installment area 13 andresults in further miniaturization.

Also in the first embodiment, the substrate transfer robot 12 takes thenormal posture in which the first arm 123, the second arm 124, and thehand 125 supporting the substrate 110 are superimposed over each otherin plan view. The substrate transfer robot 12 in the normal posturerotates within the minimal rotation area when the first arm 123 rotateson the horizontal surface about the one end of the first arm 123 as thecenter C1 of rotation. This configuration eliminates or minimizesenlargement of the minimal rotation area even when the substratetransfer robot 12 is provided with two arms (the first arm 123 and thesecond arm 124) and the hand 125. This, in turn, eliminates or minimizesenlargement of the robot installment area 13.

Also in the first embodiment, in the normal posture of the substratetransfer robot 12, the first distance between the center C1 of rotationof the first arm 123 and the distal end of the first arm 123, the seconddistance between the center C1 of rotation of the first arm 123 and thedistal end of the second arm 124, and the third distance between thecenter C1 of rotation of the first arm 123 and the distal end of thesubstrate 110 supported by the hand 125 are approximately equal to eachother. This configuration increases the maximum length of the first arm123, the second arm 124, and the hand 125 in unfolded state whileeliminating or minimizing enlargement of the minimal rotation area ofthe substrate transfer robot 12. This, in turn, ensures a widetransferable range of the substrate 110 while eliminating or minimizingenlargement of the robot installment area 13.

Also in the first embodiment, when the substrate transfer robot 12transfers the substrate 110 from a position in the substrate storageapparatus 11 to the placement position in the processing apparatus 20,the substrate transfer robot 12 folds the first arm 123 and the secondarm 124 together and protrudes the arm (the first arm 123 and the secondarm 124) into the processing apparatus 20 through the opening 202. Thisconfiguration facilitates the folding of the first arm 123 and thesecond arm 124 without the arm of the substrate transfer robot 12contacting the processing apparatus 20 even though the folding involvesoverlapping of the arm with the area of the processing apparatus.

Also in the first embodiment, the substrate transfer robot 12 moves thesubstrate 110 while keeping the center of the substrate 110 along theimaginary line L2, which is approximately parallel to the rear wall 201of the processing apparatus 20 in plan view, so as to fold the first arm123 and the second arm 124 together and protrude the arm (the first arm123 and the second arm 124) into the processing apparatus 20 through theopening 202. This configuration ensures that the substrate 110 is movedwith a uniform distance secured from the processing apparatus 20. This,in turn, facilitates the folding of the first arm 123 and the second arm124 without the substrate 110 contacting the processing apparatus 20.

Also in the first embodiment, the substrate transfer robot 12 rotatesthe hand 125 supporting the substrate 110 relative to the second arm 124so as to take the first intermediate posture, in which the center of thesubstrate 110 is on the imaginary line L2. The substrate transfer robot12 moves from the first intermediate posture while keeping the center ofthe substrate 110 along the imaginary line L2 so as to change into thesecond intermediate posture, in which the first arm 123 and the secondarm 124 are folded together. The substrate transfer robot 12 moves fromthe second intermediate posture so as to transfer the substrate 110 tothe placement position in the processing apparatus 20. Thisconfiguration easily keeps the center of the substrate 110 on theimaginary line L2 merely by rotating the hand 125, and facilitates thefolding of the first arm 123 and the second arm 124 by moving the centerof the substrate 110 along the imaginary line L2.

Also in the first embodiment, the imaginary line L2 is at anapproximately equal distance from the front wall 111 and the rear wall201. This configuration ensures that the substrate 110 is moved with auniform distance secured both from the front wall 111 and the rear wall201. This, in turn, facilitates the folding of the first arm 123 and thesecond arm 124 without the substrate 110 contacting the front wall 111and the rear wall 201.

Also in the first embodiment, when the substrate transfer robot 12transfers any one substrate 110 in the cassettes 11 a to 11 d to theplacement position in the processing apparatus 20, the substratetransfer robot 12 takes the third intermediate posture, in which withthe substrate 110 partially beyond the opening 202, the first arm 123and the second arm 124 are folded together and oriented in one direction(the Y1 direction) that is approximately orthogonal to the direction (Xdirection) that is from the center C1 of rotation of the first arm 123to the placement position in the processing apparatus 20. Thisconfiguration ensures that the first arm 123 and the second arm 124 areoriented in the same direction no matter which substrate 110 istransferred. This, in turn, eliminates or minimizes variations ofaccuracy of substrate transfer caused by a backlash that can occur when,for example, a gear is used to rotate the first arm 123 and the secondarm 124.

Also in the first embodiment, the opening 202 is open from a firstheight position through to a second height position. The first heightposition corresponds to a position at which the hand 125 and the arm(the first arm 123 and the second arm 124) have access to a substrate110 placed at a lowest position in the cassettes 11 a to 11 d of thesubstrate storage apparatus 11. The second height position correspondsto another position at which the hand 125 and the arm have access to asubstrate 110 placed at a highest position in the cassettes 11 a to 11 dof the substrate storage apparatus 11. This configuration ensures thatthe substrate transfer robot 12 easily rotates itself by utilizing theopening 202, no matter which height position in the cassettes 11 a to 11d the substrate 110 to be transferred by the substrate transfer robot 12is placed at. This, in turn, ensures that even when the substrates 110are stacked in the cassettes 11 a to 11 d, the substrate transfer robot12 easily transfers the substrate 110 without contacting the processingapparatus 20, while at the same time ensuring a reduction in size of thesubstrate processing system 100.

Second Embodiment

Next, a second embodiment will be described by referring to FIG. 7. Thesecond embodiment is different from the first embodiment in that anopening 202 a according to the second embodiment has an opening length,H2, that is smaller in height (in the Z direction) than the openinglength H1 of the opening 202 according to the first embodiment. The samereference numerals designate identical or corresponding elementsthroughout the first and second embodiments, and these elements will notbe elaborated here.

As shown in FIG. 7, a substrate processing system 200 according to thesecond embodiment includes a processing apparatus 220. The opening 202 aof the processing apparatus 220 has the opening length H2. The openinglength H2 is smaller than the movable range in the height direction ofthe first arm 123, the second arm 124, and the hand 125 of the substratetransfer robot 12. Specifically, the opening 202 a is open through to aheight corresponding to a height position at which the substratetransfer robot 12 has access to the lowest position among the 25 levelsof positions in the cassettes 11 b and 11 c, which are closer to thesubstrate transfer robot 12. The processing apparatus 220 is an exampleof the “second apparatus”.

Also in the second embodiment, the substrate transfer robot 12 iscapable of feeding and taking the substrate 110 to and from all the 25levels of positions in the cassettes 11 a and 11 d, which are fartherfrom the substrate transfer robot 12 among the four cassettes 11 a to 11d of the substrate storage apparatus 11. For the cassettes 11 b and 11c, which are closer to the substrate transfer robot 12 among the fourcassettes 11 a to 11 d of the substrate storage apparatus 11, thesubstrate transfer robot 12 is capable of feeding and taking thesubstrate 110 to and from a lowest position among the 25 levels ofpositions. The position in each of the cassettes 11 b and 11 c is anexample of the “first position”, and the position in each of thecassettes 11 a and 11 d is an example of the “third position”.

Next, an operation procedure of substrate transfer by the substratetransfer system 10 according to the second embodiment will be described.

First, by referring to FIG. 5, description will be made with regard toan operation of transferring a substrate 110 in the cassette 11 a, whichis farther from the substrate transfer robot 12, to the placementposition in the processing apparatus 220. Similarly to the firstembodiment, the substrate transfer robot 12 moves the hand 125 to aposition under a substrate 110 in the cassette 11 a so as to support thesubstrate 110. Then, the substrate transfer robot 12 linearly moves thehand 125 toward the processing apparatus 220 (in the X1 direction),thereby pulling the substrate 110 out of the cassette 11 a, and takesthe stand-by posture. Here, the substrate transfer robot 12 does notprotrude into the processing apparatus 220.

Here, in the second embodiment, the substrate transfer robot 12 in thestand-by posture moves the support shaft 122 up and down to move thefirst arm 123, the second arm 124, and the hand 125 to a height positioncorresponding to the opening 202 a. This ensures that the substratetransfer robot 12 is able to, in its later movements, protrude the firstarm 123, the second arm 124, and the hand 125 into the processingapparatus 220 through the opening 202 a. The movements following thestand-by posture are similar to the movements in the first embodimentand will not be elaborated here.

The movements of the substrate transfer robot 12 according to the secondembodiment involved in the transfer of a substrate 110 placed at alowest position in the cassettes 11 b and 11 c, which are closer to thesubstrate transfer robot 12, to the placement position in the processingapparatus 220 are similar to the movements in the first embodiment andwill not be elaborated here. In the substrate transfer robot 12according to the second embodiment, it is not possible to transfersubstrates 110 other than the substrate 110 at the lowest position inthe cassettes 11 b and 11 c, which are closer to the substrate transferrobot 12; otherwise, the substrate transfer robot 12 would come intocontact with the processing apparatus 220.

The second embodiment is otherwise similar to the first embodiment.

In the second embodiment, the opening 202 a is open through to a heightcorresponding to a substrate 110 placed at the cassettes 11 b and 11 c,which are closer to the substrate transfer robot 12. When the substratetransfer robot 12 seeks access to a position in the cassettes 11 a and11 d, which are farther from the substrate transfer robot 12, thesubstrate transfer robot 12 pulls the substrate 110 out of the cassette11 a or 11 d, and then moves the hand 125 and the arm (the first arm 123and the second arm 124) in the height direction so as to protrude thearm into the processing apparatus 220 through the opening 202 a. Thisconfiguration diminishes the robot installment area 13 and ensuresminiaturization while inhibiting an excessive increase in size of theopening 202 a. Inhibiting an excessive increase in size of the opening202 a eliminates or minimizes contamination of the robot installmentarea 13, in which the air needs to be kept clean, by foreign matterthrough the opening 202 a.

The advantageous effects of the second embodiment are otherwise similarto the advantageous effects of the first embodiment.

Third Embodiment

Next, a third embodiment will be described by referring to FIG. 8. Inthe third embodiment, a robot installment area 313 is defined betweentwo processing apparatuses 20 and 320, as opposed to the robotinstallment area 13 according to the first embodiment, which is definedbetween the substrate storage apparatus 11 and the processing apparatus20. The same reference numerals designate identical or correspondingelements throughout the first and third embodiments, and these elementswill not be elaborated here.

As shown in FIG. 8, in a substrate processing system 300 according tothe third embodiment, the two processing apparatuses 20 and 320 arealigned in the X direction and face one another. The processingapparatus 320 has a configuration similar to the configuration of theprocessing apparatus 20 according to the first embodiment, and issymmetrical relative to the processing apparatus 20 about a center linebetween the two processing apparatuses 20 and 320. Specifically, theprocessing apparatus 320 includes a front wall 301 and an opening 302,which respectively correspond to the rear wall 201 and the opening 202of the processing apparatus 20. The processing apparatus 320 is anexample of the “first apparatus”, and the front wall 301 is an exampleof the “first wall”.

The robot installment area 313 according to the third embodiment isdefined between the rear wall 201 of the processing apparatus 20 and thefront wall 301 of the processing apparatus 320. In the robot installmentarea 313, the substrate transfer robot 12 is disposed. The substratetransfer robot 12 is capable of transferring a substrate 110 between thetwo processing apparatuses 20 and 320. The substrate transfer robot 12is disposed at such a position that the outer periphery of the minimalrotation area overlaps the inside of the processing apparatus 20 throughthe opening 202 of the processing apparatus 20. Also the position of thesubstrate transfer robot 12 is where the outer periphery of the minimalrotation area overlaps the inside of the processing apparatus 320through the opening 302 of the processing apparatus 320. That is, theminimal rotation radius R of the substrate transfer robot 12 is largerthan the distance between the center C1 of rotation of the first arm 123and the rear wall 201 of the processing apparatus 20, and is larger thanthe distance between the center C1 of rotation of the first arm 123 andthe front wall 301 of the processing apparatus 320. The substratetransfer robot 12 is capable of 360-degree rotation when in the normalposture, in which the first arm 123, the second arm 124, and the hand125 are superimposed over each other.

Also in the substrate transfer robot 12, the center C1 of rotation ofthe first arm 123 is disposed at a position that faces both the openings202 and 302. Specifically, in plan view, the center C1 of rotation ofthe first arm 123 is disposed on a line L1 extending from the center ofthe substrate 110 placed at the placement position in the processingapparatus 20 to an approximate center of the opening 202. Also in thethird embodiment, the two processing apparatuses 20 and 320 and thesubstrate transfer robot 12 are disposed such that the line L1 passesthrough the center of the substrate 110 at the placement position in theprocessing apparatus 320 and through an approximate center of theopening 302 of the processing apparatus 320. The center C1 of rotationof the first arm 123 is at an approximately equal distance from the twoprocessing apparatuses 20 and 320. The placement position in theprocessing apparatus 320 is an example of the “first position”.

The third embodiment is otherwise similar to the first embodiment.

In the third embodiment, the substrate transfer robot 12 is disposed inthe robot installment area 313 defined between the two opposingprocessing apparatuses 20 and 320. In this configuration, the outerperiphery of the minimal rotation area of the substrate transfer robot12 overlaps the insides of the processing apparatuses 20 and 320respectively through the openings 202 and 302. This reduces the distancebetween the substrate transfer robot 12 and the one processing apparatus20 and the distance between the substrate transfer robot 12 and theother processing apparatus 320 at the same time. This diminishes therobot installment area 313 and ensures miniaturization of the substrateprocessing system 300 even when the substrate transfer robot 12 isdisposed in the robot installment area 313 defined between the twoprocessing apparatuses 20 and 320.

The advantageous effects of the third embodiment are otherwise similarto the advantageous effects of the first embodiment.

Fourth Embodiment

Next, a fourth embodiment will be described by referring to FIG. 9. Thefourth embodiment is different from the first embodiment in that aprocessing apparatus 420 has two placement positions located indirections approximately orthogonal to one another from the center C1 ofrotation of the first arm 123. The same reference numerals designateidentical or corresponding elements throughout the first and fourthembodiments, and these elements will not be elaborated here.

As shown in FIG. 9, in a substrate processing system 400 according tothe fourth embodiment, the processing apparatus 420 includes anapproximately L-shaped wall 401. The wall 401 includes a rear wall 401 aand a side wall 401 b. The rear wall 401 a is approximately parallel tothe front wall 111 of the substrate storage apparatus 11, and the sidewall 401 b is approximately perpendicular to the front wall 111. Therear wall 401 a has an approximately rectangular opening 402. The sidewall 401 b has an approximately rectangular opening 403. The processingapparatus 420 is an example of the “second apparatus”, and the rear wall401 a is an example of the “second wall”.

In the fourth embodiment, a robot installment area 413 is definedbetween the front wall 111 of the substrate storage apparatus 11 and theapproximately L-shaped wall 401 of the processing apparatus 420. In therobot installment area 413, the substrate transfer robot 12 is disposed.The substrate transfer robot 12 is capable of transferring a substrate110 among the substrate storage apparatus 11 and two placement positionsin the processing apparatus 420. Also the substrate transfer robot 12 isdisposed at such a position that the outer periphery of the minimalrotation area overlaps the inside of the processing apparatus 420through the opening 402 of the rear wall 401 a and the opening 403 ofthe side wall 401 b. That is, the minimal rotation radius R of thesubstrate transfer robot 12 is larger than the distance between thecenter C1 of rotation of the first arm 123 and the rear wall 401 a, andlarger than the distance between the center C1 of rotation of the firstarm 123 and the side wall 401 b. The two placement positions in theprocessing apparatus 420 are examples of the “second position”.

In the substrate transfer robot 12, the center C1 of rotation of thefirst arm 123 is disposed at a position that faces both the openings 402and 403. Specifically, in plan view, the center C1 of rotation of thefirst arm 123 is disposed on a line L3 extending from the center of asubstrate 110 placed at one placement position in the processingapparatus 420 to an approximate center of the opening 402 of the rearwall 401 a. Also in plan view, the center C1 of rotation of the firstarm 123 is disposed on a line L4 extending from the center of asubstrate 110 placed at the other placement position in the processingapparatus 420 to an approximate center of the opening 403 of the sidewall 401 b. The line L3 and the line L4 are approximately orthogonal toone another. The substrate transfer robot 12 is disposed such that thedistance between the center C1 of rotation of the first arm 123 and thefront wall 111 of the substrate storage apparatus 11 is larger than theminimal rotation radius R. The substrate transfer robot 12 is capable of360-degree rotation when in the normal posture, in which the first arm123, the second arm 124, and the hand 125 are superimposed over eachother.

The fourth embodiment is otherwise similar to the first embodiment.

In the fourth embodiment, the processing apparatus 420 has two placementpositions located in directions approximately orthogonal to one anotherfrom the center C1 of rotation of the first arm 123. In thisconfiguration, the outer periphery of the minimal rotation area of thesubstrate transfer robot 12 overlaps the inside of the processingapparatus 420 through the opening 402 of the rear wall 401 a and theopening 403 of the side wall 401 b. This reduces both the distancebetween the substrate transfer robot 12 and the rear wall 401 a and thedistance between the substrate transfer robot 12 and the side wall 401b. This, in turn, diminishes the robot installment area 413 in twoorthogonal directions (X direction and Y direction), the robotinstallment area 413 being defined by the front wall 111 of thesubstrate storage apparatus 11, the rear wall 401 a, and the side wall401 b, which is approximately orthogonal to the rear wall 401 a.

The advantageous effects of the fourth embodiment are otherwise similarto the advantageous effects of the first embodiment.

In the first to fourth embodiments, the substrate transfer robot hasbeen exemplified as including two arms (the first arm and the secondarm). This, however, should not be construed in a limiting sense. Thesubstrate transfer robot may include a single arm or three or more arms.

Also in the first to fourth embodiments, the substrate transfer robothas been exemplified as including a single hand. This, however, shouldnot be construed in a limiting sense. As shown in FIG. 10, a substratetransfer robot 512 including two hands is also possible. A substratetransfer robot including three or more hands is also possible.

In the first embodiment, the imaginary line has been exemplified asbeing at an approximately equal distance from the first wall and thesecond wall. This, however, should not be construed in a limiting sense.The imaginary line may be closer to either the first wall or the secondwall insofar as no interference occurs between the substrate transferrobot and the first and second walls when the substrate transfer robotchanges from the first intermediate posture to the second intermediateposture.

Also in the first to fourth embodiments, the robot installment area hasbeen exemplified as being defined between the front wall (first wall)and the rear wall (second wall) that are approximately parallel to oneanother. This, however, should not be construed in a limiting sense. Therobot installment area may be defined between a first wall and a secondwall that are orthogonal to one another.

Also in the first to fourth embodiments, the second apparatus has beenexemplified as a processing apparatus in a manufacturing process of asemiconductor device. This, however, should not be construed in alimiting sense. The second apparatus may be other than the processingapparatus in a manufacturing process of a semiconductor device. Otherexamples include a temporary substrate stand apparatus to forward asubstrate to a next step.

Also in the first to fourth embodiments, the center of rotation of thefirst arm has been exemplified as being on a line extending from thecenter of the substrate placed at the placement position in theprocessing apparatus (second apparatus) to an approximate center of theopening. This, however, should not be construed in a limiting sense. Thecenter of rotation of the first arm may be off the line extending fromthe center of the substrate placed at the placement position in thesecond apparatus to an approximate center of the opening, insofar as thecenter of rotation of the first arm is disposed at a position that facesthe opening.

Also in the first to fourth embodiments, the first distance between thecenter of rotation of the first arm and the distal end of the first arm,the second distance between the center of rotation of the first arm andthe distal end of the second arm, and the third distance between thecenter of rotation of the first arm and the distal end of the substratesupported by the hand are approximately equal to each other, and thefirst to third distances are larger than the distance between the centerof rotation of the first arm and the rear wall (second wall). This,however, should not be construed in a limiting sense. At least onedistance among the first to third distances may be larger than thedistance between the center of rotation of the first arm and the secondwall.

Also in the first to fourth embodiments, the opening has beenexemplified as being provided on the rear wall (second wall) of theprocessing apparatus serving as the second apparatus. This, however,should not be construed in a limiting sense. For example, it is possibleto provide the first apparatus with both a first wall and a second wallprovided with an opening. It is also possible to provide a second wallseparate from the first apparatus and the second apparatus, and providean opening on the second wall.

In the first and second embodiments, when the substrate is transferredfrom any of the cassettes, the first arm and the second arm have beenexemplified as being oriented in one direction (in the Y1 direction)from the center of rotation of the first arm in the third intermediateposture. This, however, should not be construed in a limiting sense. Tominimize the time spent in transferring the substrate, it is possible inthe third intermediate posture to change the orientation of the firstarm and the second arm conveniently depending on the position of thecassette.

In the second embodiment, the cassettes 11 b and 11 c, which are closerto the substrate transfer robot, have been exemplified as accommodatingsubstrates only at the lowest positions in the cassettes 11 b and 11 c,with the opening length H2 of the opening being set at a heightcorresponding to a position at which the substrate transfer robot hasaccess to the lowest positions in the cassettes 11 b and 11 c, which arecloser to the substrate transfer robot. This, however, should not beconstrued in a limiting sense. It is possible to accommodate and stack aplurality of substrates in the cassettes 11 b and 11 c, which are closerto the substrate transfer robot, insofar as the opening has a heightcorresponding to the position at which the substrate transfer robot hasaccess to any of the substrates accommodated in the cassettes 11 b and11 c, which are closer to the substrate transfer robot.

Obviously, numerous modifications and variations of the presentdisclosure are possible in light of the above teachings. It is thereforeto be understood that within the scope of the appended claims, thepresent disclosure may be practiced otherwise than as specificallydescribed herein.

What is claimed as new and desired to be secured by Letters Patent ofthe United States is:
 1. A substrate transfer system comprising: asubstrate transfer robot provided between a first apparatus and a secondapparatus which has a wall provided opposite to the substrate transferrobot and having an opening on the wall, the first apparatus including aplurality of cassettes disposed at different locations in the firstapparatus, the substrate transfer robot being configured to transfer asubstrate from each of the plurality of cassettes of the first apparatusto the second apparatus via the opening and comprising: a base having afirst axis; an arm body having a proximal end and a distal end andconnected to the base at the proximal end to rotate around the firstaxis; a hand connected to the distal end of the arm body and configuredto hold the substrate so as to carry the substrate from the firstapparatus to the second apparatus; and a minimum distance from the firstaxis to an outermost portion of the arm body and the hand in a radiusdirection from the first axis being larger than a distance between thefirst axis and the opening on the wall when the base is provided at agiven location, wherein the opening has at least two edges atintersections between the opening and the wall, the at least two edgesextending parallel to the first axis, and wherein the minimum distanceis shorter than a shortest distance among distances between the firstaxis and the at least two edges as the arm body and the hand are rotatedabout the first axis at the given location of the base.
 2. The substratetransfer system according to claim 1, wherein the base is stationaryrelative to the first apparatus and the second apparatus.
 3. Thesubstrate transfer system according to claim 1, wherein the first axisextends along a substantially vertical direction.
 4. The substratetransfer system according to claim 1, wherein the hand is connected tothe distal end of the arm body via a hand axis to rotate around the handaxis.
 5. The substrate transfer system according to claim 4, wherein thehand axis extends substantially parallel to the first axis.
 6. Thesubstrate transfer system according to claim 1, wherein the hand supportthe substrate on the hand.
 7. The substrate transfer system according toclaim 1, wherein the arm body comprises a plurality of arms comprising:a first arm which has the proximal end and a first end opposite to theproximal end and which is connected to the base at the proximal end torotate around the first axis.
 8. The substrate transfer system accordingto claim 7, wherein the plurality of arms comprise a second arm whichhas the distal end and a second end opposite to the distal end and whichis connected to the first end of the first arm at the second end via asecond axis substantially parallel to the first axis to rotate aroundthe second axis.
 9. The substrate transfer system according to claim 7,wherein the minimum distance is a length of the first arm from the firstaxis to an outermost portion of the first arm.
 10. The substratetransfer system according to claim 1, wherein the substrate transferrobot is provided between a first apparatus and a second apparatus suchthat a distance between the first apparatus and the first axis isshorter than a distance between the second apparatus and the first axis.11. A substrate processing system comprising: a first apparatusincluding a plurality of cassettes disposed at different locations inthe first apparatus; a second apparatus which has a wall having anopening on the wall; a substrate transfer robot provided between thefirst apparatus and the second apparatus and opposite to the opening,the substrate transfer robot being configured to transfer a substratefrom each of the plurality of cassettes of the first apparatus to thesecond apparatus via the opening and comprising: a base having a firstaxis; an arm body having a proximal end and a distal end and connectedto the base at the proximal end to rotate around the first axis; a handconnected to the distal end of the arm body and configured to hold thesubstrate so as to carry the substrate from the first apparatus to thesecond apparatus; and a minimum distance from the first axis to anoutermost portion of the arm body and the hand in a radius directionfrom the first axis being larger than a distance between the first axisand the opening on the wall when the base is provided at a givenlocation, wherein the opening has at least two edges at intersectionsbetween the opening and the wall, the at least two edges extendingparallel to the first axis, and wherein the minimum distance is shorterthan a shortest distance among distances between the first axis and theat least two edges as the arm body and the hand are rotated about thefirst axis at the given location of the base.